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Presentations and Articles - page 2

 

Leading Edge Logic Landscape 2018 - a comparison of the leading edge logic technologies from GLOBALFOUNDRIES, Intel, Samsung and TSMC. This article was published on SemiWiki on March 12, 2018.

 

SPIE Advanced Lithography 2018 - EUV Status - a summary of selected papers from the 2018 SPIE Advanced Lithography Conference. This article was posted on SemiWiki on March 7, 2018.

 

LithoVision 2018 The Evolving Semiconductor Technology Landscape and What it Means for Lithography - Scotten Jones presented at Nikon's Litho Vision and this article is a write up of the talk. This was published on SemiWiki on February 25, 2018.

 

IEDM 2017 - Leti Gate-All-Around Stacked-Nanowires - Leti has been a pioneer in gate-all around and at IEDM they presented an overview of the technology. This article was published on Semiwiki on published February 12, 2018.

 

IEDM 2017 - Controlling Threshold Voltage with Work Function Metals - a discussion of the recent transition to work function metals for threshold voltage control for leading edge logic processes. This article was published on SemiWiki on January 26, 2018.

 

ISS 2018 - The Impact of EUV on the Semiconductor Supply Chain - a write up of a paper presented by Scotten Jones at ISS 2018 analyzing how EUV will effect the industry. This article was published on SemiWiki on January 18, 2018.

 

IIEDM 2017 - imec Charting the Future of Logic - a summary of imec's logic presentations at IEDM. This article was posted in SemiWiki on January 4, 2018.

 

IEDM 2017 - Intel Versus GLOBALFOUNDRIES at the Leading Edge - a discussion of Intel's 10nm and GLOBALFOUNDRIES 7nm process papers delivered at IEDM. This article was published on SemiWiki on December 17, 2017.

 

GLOBALFOUNDRIES RF Leadership - a detailed review of the requirements for various RF applications and GLOBALFOUNDRIES extensive set of RF focused process options. This article was published on SemiWiki on October 20, 2017.

 

IEDM 2017 Preview - a preview of the upcoming IEDM conference. This article was published on SemiWiki on October 20, 2017.

 

GLOBALFOUNDRIES is hitting on all cylinders - a review of the GLOBALFOUNDRIES Technology Conference 2017. This article was published on SemiWiki on September 28, 2017.

 

SEMICON West - EUV Readiness Update - the current status of EUV based on presentations and interviews at SEMICON West. This article was published on SemiWiki on August 11, 2017.

 

SEMICON West - The FDSOI Ecosystem - a discussion of the FDSOI Ecosystem including information from interviews and presentations at SEMICON West. This article was published on SemiWiki on July 21, 2017.

 

Standard Node Trend - an analysis of how node names compare to a variety of physical features. This article was published on SemiWiki on July 15, 2017.

 

Exclusive - GLOBALFOUNDRIES disclose 7nm process detail - in an exclusive interview GLOBALFOUNDRIES has disclosed the details of their 7nm process. This article was published on SemiWiki on July 5, 2017.

 

3D NAND Myths and Realities - an analysis of 3D NAND technologies and costs. This article was published on SemiWiki on June 30, 2017.

 

Samsung Details Foundry Roadmap - an article covering the details of Samsung's recently announced foundry roadmap. This article was published on SemiWiki on June 9, 2017.

 

SPIE 2017 - ASML Interview and Presentations - An article summarizing ASML's presentations at the SPIE Advanced Lithography Conference plus and interview with Mike Lercel of ASML at the same conference. This article was published on SemiWiki on April 19, 2017.

 

SPIE 2017 ASML and Cadence EUV impact on place and route - ASML and Cadence have teamed up to offer improved tools to evaluate deign impacts on lithography and yields. This article was published on SemiWiki on April 13, 2017.

 

SPIE 2017: Irresistible Materials EUV Photoresist - Irresistible Materials has developed a new type of EUV photoresist with the potential to provide improved performance. This article was published on SemiWiki on April 11, 2017.

 

14nm 16nm 10nm and 7nm - What we know now - A comparison of the leading-edge logic processes by company. This article was published on SemiWiki on April 7, 2017.

 

Shootout at 22nm - a discussion and comparison of the 22nm processes from GLOBALFOUNDRIES, TSMC and Intel. This article was published on SemiWiki on April 3, 2017.

 

Intel Manufacturing Day: Nodes must die, but Moore's Law lives! - a discussion of the issues with node names and the status of Moore's law. This article was published on SemiWiki on March 29, 2017.

 

SPIE 2017: EUV Readiness for High Volume Manufacturing - a summary of the EUV readiness for HVM presentations during the first day of the SPIE Advanced Lithography Conference. This article wa published on SemiWiki on March 3, 2017.

 

An Steegen ISS Talk and Interview - Patterning Options for Advanced Nodes - a discussion of An Steegen's presentation at ISS 2017. This article was published on SemiWiki on February 28th.

 

Scott Jones ISS Talk - Moore's Law Lives - At ISS 2017 our president Scotten W. Jones gave a talk on advanced logic. This article summarizes that talk. This article was published on SemiWiki on February 7, 2017.

 

ISS Gary Patton Keynote: FD-SOI, FinFETS, and Beyond! - Gary Patton CTO of GLOBALFOUNDRIES keynote and interview at ISS. This article was published on SemiWiki on January 25, 2017.

 

The 2017 Leading Edge Semiconductor Landscape - an analysis and comparison of leading edge logic processes out to the 5nm node. This article was published on SemiWiki on December 26, 2016.

 

IEDM 2016 - Marie Semeria LETI Interview - an interview with Leti CEO Marie Semeria covering developments in FDSOI and Horizontal nanowires. This article was published on Semiwki on December 21, 2016.

 

More articles and presentation on page 3

 

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